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Volumn 180-181, Issue , 2004, Pages 407-412

The influence of the N2-H2 mixture composition on the spectroscopic and temporal behaviour of glow discharge characteristics in pulse-supplied nitriding processes

Author keywords

Active species; I U characteristics of the discharge; Optical emission spectroscopy; Plasma nitriding; Temporal evolution of active elements concentration

Indexed keywords

COMPOSITION; CURRENT VOLTAGE CHARACTERISTICS; EMISSION SPECTROSCOPY; GLOW DISCHARGES; MIXTURES; NITRIDING; PLASMA APPLICATIONS;

EID: 16744368021     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.10.151     Document Type: Article
Times cited : (18)

References (7)
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    • Bell, T.1    Dong, H.2    Sun, Y.3
  • 5
    • 0003903459 scopus 로고    scopus 로고
    • Industrial plasma engineering
    • Bristol and Philadelphia: Institute of Physics Publishing
    • Reece Roth J. Industrial plasma engineering Applications to Non-thermal Plasma Processing 2 2001 Institute of Physics Publishing Bristol and Philadelphia
    • (2001) Applications to Non-thermal Plasma Processing , vol.2
    • Reece Roth, J.1
  • 6
    • 0003691078 scopus 로고
    • D. A. Glocker, & S. Ismat Shah (Eds.), Bristol and Philadelphia: Institute of Physics Publishing
    • Ranga E. Glocker D.A. Ismat Shah S. Handbook of Thin Film Process Technology 1995 Institute of Physics Publishing Bristol and Philadelphia
    • (1995) Handbook of Thin Film Process Technology
    • Ranga, E.1
  • 7
    • 0043194084 scopus 로고    scopus 로고
    • 2 mixtures under DC-pulsed substrate biasing
    • 2 mixtures under DC-pulsed substrate biasing Surf. Coat. Technol. 174-175 2003 1211
    • (2003) Surf. Coat. Technol. , vol.174-175 , pp. 1211
    • Walkowicz, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.