Plasma reactions of N2O on hydrogenated amorphous carbon films by PECVD

Surface and Coatings Technology

Volumn 180-181, Issue , 2004, Pages 250-253

  Kim, Y T ^a   Yoon, S G ^a,b   Jung, S C ^b   Suh, S J ^a   Yoon, D H ^a  

^a Sungkyunkwan University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Annealing; Diamond like carbon; Plasma enhanced chemical vapor deposition

Indexed keywords

ELLIPSOMETRY; FILM GROWTH; HYDROGENATION; INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS;

ROOT MEAN SQUARE (RMS);

DIAMOND LIKE CARBON FILMS;

PLASMA TREATMENT;

EID: 16744365045     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.10.158     Document Type: Article

References (13)

1. Lifshitz Y. Diamond Relat. Mater. 8 1999 1659
2. Paul L.M. Nature 393 1998 16
3. Grill A. Diamond Relat. Mater 8 1998 428
4. Mirtich M.J. Nir D. Swec D. Banks B. J. Vac. Sci. Technol. A 4 1986 2680
5. Moravec T.J. Lee J.C. J. Vac. Sci. Technol. 20 1982 338
6. Robertson J. O'Reilly E.P. Phys. Rev. B 35 1987 2946
7. Tsai H.C. Bogy D.B. J. Vac. Sci. Technol. A 5 1987 3287
8. Celii F.G. Butler J.E. Ann. Rev. Phys. Chem. 42 1991 643
9. Muranaka Y. Yamashita H. Miyadera H. Thin Solid Films 195 1991 257
10. Muranaka Y. Yamashita H. Miyadera H. J. Appl. Phys. 69 1991 8145
11. Bou P. Vandenbulcke L. Herbin R. Hillion F. J. Mater. Res. 7 8 1992 2151
12. Mariotto G. Freire F.L.Jr. Achete C.A. Thin Solid Films 241 1994 255
13. Wei J. Chang J.M. Tzeng Y. Thin Solid Films 212 1-2 1992 91