Focused ion beam-secondary ion mass spectrometry analyses of nanostructured thin films

Surface and Coatings Technology

Volumn 180-181, Issue , 2004, Pages 323-330

  Lamperti, A ^a   Bottani, C E ^a   Ossi, P M ^a   Levi Setti, R ^b  

^a POLITECNICO DI MILANO   (Italy)

^b UNIVERSITY OF CHICAGO   (United States)

Author keywords

Carbon cluster assembled films; Fluorinated amorphous carbon; Focused ion beam secondary ion mass spectrometry; Imaging; Mass spectra; Titanium oxide films

Indexed keywords

AMORPHOUS FILMS; CARBON; ION BEAMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; THIN FILMS; TITANIUM OXIDES;

FOCUSED ION BEAMS (FIB); MASS DISTRIBUTION;

NANOSTRUCTURED MATERIALS;

COATING;

EID: 16744362675     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.10.079     Document Type: Article

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