Correction to “Electrochemical preparation of Yb[sbnd]Bi thin film in dimethylsulfoxide” [Electrochem. Commun. 6(2004) 441–446](S1388248104000438)(10.1016/j.elecom.2004.03.002);Electrochemical preparation of Yb-Bi thin film in dimethylsulfoxide

Electrochemistry Communications

Volumn 6, Issue 5, 2004, Pages 441-446

  Li, Gao Ren ^a   Liu, Guan Kun ^a   Tong, Ye Xiang ^a  

^a SUN YAT SEN UNIVERSITY   (China)

Author keywords

Amorphous; Bismuth; Electrodeposition; Thin film; Ytterbium

Indexed keywords

AMPEROMETRIC SENSORS; CRYSTALLIZATION; CYCLIC VOLTAMMETRY; DIFFUSION; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; HEAT TREATMENT; LITHIUM COMPOUNDS; POTENTIOMETRIC SENSORS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; YTTERBIUM;

CHRONOPOTENTIOMETRIC CURVE; TRANSFER COEFFICIENT;

ELECTROCHEMISTRY;

BISMUTH DERIVATIVE; DIMETHYL SULFOXIDE; PLATINUM; YTTERBIUM;

AMPEROMETRY; ARTICLE; CALCULATION; CRYSTALLIZATION; CYCLIC POTENTIOMETRY; DIFFUSION COEFFICIENT; ELECTROCHEMISTRY; ELECTRODE; FILM; POTENTIOMETRY; X RAY DIFFRACTION;

EID: 16544380092     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2019.106480     Document Type: Erratum

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