메뉴 건너뛰기




Volumn 20, Issue 2, 2004, Pages 121-125

Nonlinear diffusion process modeling using response surface methodology and variable transformation

Author keywords

D optimal design; Process modeling; Response surface methodology; Variable transformation

Indexed keywords

DATA REDUCTION; DIFFUSION; ETCHING; FABRICATION; MATHEMATICAL MODELS; MATRIX ALGEBRA; NONLINEAR SYSTEMS; PROCESS ENGINEERING; SEMICONDUCTOR DEVICE MANUFACTURE; STATISTICAL METHODS; SURFACE PROPERTIES;

EID: 1642634489     PISSN: 07365845     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.rcim.2003.10.002     Document Type: Article
Times cited : (6)

References (15)
  • 1
    • 0034784430 scopus 로고    scopus 로고
    • Device optimization using response surface methodology with orthogonal arrays
    • Kyoto, Japan
    • Ching P, Chen MR. Device optimization using response surface methodology with orthogonal arrays. Sixth IEEE International Workshop, Kyoto, Japan, 2001. p. 17-20.
    • (2001) Sixth IEEE International Workshop , pp. 17-20
    • Ching, P.1    Chen, M.R.2
  • 2
    • 0024931842 scopus 로고
    • An efficient methodology for building macromodels of IC fabrication processes
    • Low K.K., Director S.W. An efficient methodology for building macromodels of IC fabrication processes. IEEE Trans CAD. 8(12):1989;1299-1313.
    • (1989) IEEE Trans CAD , vol.8 , Issue.12 , pp. 1299-1313
    • Low, K.K.1    Director, S.W.2
  • 3
    • 0026153051 scopus 로고
    • Statistical experimental design in plasma etch modeling
    • May G.S., Huang J., Spanos C.J. Statistical experimental design in plasma etch modeling. IEEE Trans Semin Manuf. 4(2):1991;52-58.
    • (1991) IEEE Trans Semin Manuf , vol.4 , Issue.2 , pp. 52-58
    • May, G.S.1    Huang, J.2    Spanos, C.J.3
  • 4
    • 0029734371 scopus 로고    scopus 로고
    • Gallium arsenide etching using ion beams from hydrogen/methane mixtures
    • Villavilla J.M., Santos C., Valles-Abarca J.A. Gallium arsenide etching using ion beams from hydrogen/methane mixtures. Vaccum. 47(1):1996;39-44.
    • (1996) Vaccum , vol.47 , Issue.1 , pp. 39-44
    • Villavilla, J.M.1    Santos, C.2    Valles-Abarca, J.A.3
  • 5
    • 0033341829 scopus 로고    scopus 로고
    • Statistical optimization and manufacturing sensitivity analysis of 0.18 μm SOI MOSFETs
    • Williams S., Varahramyan K., Maszara W. Statistical optimization and manufacturing sensitivity analysis of 0.18. μm SOI MOSFETs Microelectron J. 49:1999;245-261.
    • (1999) Microelectron J , vol.49 , pp. 245-261
    • Williams, S.1    Varahramyan, K.2    Maszara, W.3
  • 7
    • 0034250644 scopus 로고    scopus 로고
    • Zinc diffusion process investigation of InP-based test structures for high-peed avalanche photodiode fabrication
    • Yun I., Hyun K. Zinc diffusion process investigation of InP-based test structures for high-peed avalanche photodiode fabrication. Microelectron J. 31:2000;635-639.
    • (2000) Microelectron J , vol.31 , pp. 635-639
    • Yun, I.1    Hyun, K.2
  • 9
    • 0344008716 scopus 로고
    • BBN Software Products Corporation
    • RS/DISCOVER USER's Guide. BBN Software Products Corporation, 1988.
    • (1988) RS/Discover User's Guide
  • 13
    • 0030244227 scopus 로고    scopus 로고
    • New 2D diffusion simulator using spatial variable transformation
    • Jog S., Sundarsingh V.P. New 2D diffusion simulator using spatial variable transformation. Microelectron J. 27:1996;571-575.
    • (1996) Microelectron J , vol.27 , pp. 571-575
    • Jog, S.1    Sundarsingh, V.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.