-
1
-
-
0034784430
-
Device optimization using response surface methodology with orthogonal arrays
-
Kyoto, Japan
-
Ching P, Chen MR. Device optimization using response surface methodology with orthogonal arrays. Sixth IEEE International Workshop, Kyoto, Japan, 2001. p. 17-20.
-
(2001)
Sixth IEEE International Workshop
, pp. 17-20
-
-
Ching, P.1
Chen, M.R.2
-
2
-
-
0024931842
-
An efficient methodology for building macromodels of IC fabrication processes
-
Low K.K., Director S.W. An efficient methodology for building macromodels of IC fabrication processes. IEEE Trans CAD. 8(12):1989;1299-1313.
-
(1989)
IEEE Trans CAD
, vol.8
, Issue.12
, pp. 1299-1313
-
-
Low, K.K.1
Director, S.W.2
-
3
-
-
0026153051
-
Statistical experimental design in plasma etch modeling
-
May G.S., Huang J., Spanos C.J. Statistical experimental design in plasma etch modeling. IEEE Trans Semin Manuf. 4(2):1991;52-58.
-
(1991)
IEEE Trans Semin Manuf
, vol.4
, Issue.2
, pp. 52-58
-
-
May, G.S.1
Huang, J.2
Spanos, C.J.3
-
4
-
-
0029734371
-
Gallium arsenide etching using ion beams from hydrogen/methane mixtures
-
Villavilla J.M., Santos C., Valles-Abarca J.A. Gallium arsenide etching using ion beams from hydrogen/methane mixtures. Vaccum. 47(1):1996;39-44.
-
(1996)
Vaccum
, vol.47
, Issue.1
, pp. 39-44
-
-
Villavilla, J.M.1
Santos, C.2
Valles-Abarca, J.A.3
-
5
-
-
0033341829
-
Statistical optimization and manufacturing sensitivity analysis of 0.18 μm SOI MOSFETs
-
Williams S., Varahramyan K., Maszara W. Statistical optimization and manufacturing sensitivity analysis of 0.18. μm SOI MOSFETs Microelectron J. 49:1999;245-261.
-
(1999)
Microelectron J
, vol.49
, pp. 245-261
-
-
Williams, S.1
Varahramyan, K.2
Maszara, W.3
-
6
-
-
0029237725
-
Wafer mapping using DOE and RSM techniques
-
Nara, Japan
-
Waslton AJ, Fallon M, Wilson D. Wafer mapping using DOE and RSM techniques. Proceedings of the IEEE 1995 International Conference on Microelectronic Test Structure, Nara, Japan, 1995. p. 289-94.
-
(1995)
Proceedings of the IEEE 1995 International Conference on Microelectronic Test Structure
, pp. 289-294
-
-
Waslton, A.J.1
Fallon, M.2
Wilson, D.3
-
7
-
-
0034250644
-
Zinc diffusion process investigation of InP-based test structures for high-peed avalanche photodiode fabrication
-
Yun I., Hyun K. Zinc diffusion process investigation of InP-based test structures for high-peed avalanche photodiode fabrication. Microelectron J. 31:2000;635-639.
-
(2000)
Microelectron J
, vol.31
, pp. 635-639
-
-
Yun, I.1
Hyun, K.2
-
8
-
-
0028829466
-
D-optimal designs
-
de Aguiar P.F., Bourguignon B., Khots M.S., Massart D.L., Phan-Than-Luu R. D-optimal designs. Chemometrics Intell Lab Systems. 30:1995;199-210.
-
(1995)
Chemometrics Intell Lab Systems
, vol.30
, pp. 199-210
-
-
De Aguiar, P.F.1
Bourguignon, B.2
Khots, M.S.3
Massart, D.L.4
Phan-Than-Luu, R.5
-
9
-
-
0344008716
-
-
BBN Software Products Corporation
-
RS/DISCOVER USER's Guide. BBN Software Products Corporation, 1988.
-
(1988)
RS/Discover User's Guide
-
-
-
11
-
-
0003664269
-
-
Homewood, IL: Irwin
-
Neter J, Kunter MH, Nachtsheim CJ, Wasserman W. In: Applied linear regression models. Homewood, IL: Irwin, 1990.
-
(1990)
Applied Linear Regression Models
-
-
Neter, J.1
Kunter, M.H.2
Nachtsheim, C.J.3
Wasserman, W.4
-
13
-
-
0030244227
-
New 2D diffusion simulator using spatial variable transformation
-
Jog S., Sundarsingh V.P. New 2D diffusion simulator using spatial variable transformation. Microelectron J. 27:1996;571-575.
-
(1996)
Microelectron J
, vol.27
, pp. 571-575
-
-
Jog, S.1
Sundarsingh, V.P.2
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