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Volumn , Issue , 1998, Pages 172-186

Solderability testing in nitrogen atmosphere of plasma treated HASL finish PCBs for fluxless soldering

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL ANALYSIS; CHEMICAL CLEANING; CONTACT ANGLE; DROPS; INDUSTRIAL ELECTRONICS; INERT GASES; MOLECULAR OXYGEN; NITROGEN; ORGANIC CARBON; ORGANIC CHEMICALS; ORGANIC POLLUTANTS; PRINTED CIRCUIT BOARDS; SOLDERING; VOLATILE ORGANIC COMPOUNDS; WETTING;

EID: 1642620140     PISSN: 10898190     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEMT.1998.731073     Document Type: Conference Paper
Times cited : (11)

References (13)
  • 1
    • 51249170677 scopus 로고
    • The effect of gold-nickel metallization microstructure on fluxless soldering
    • R. B Cinque and J. W Morris, JR, "The effect of Gold-Nickel Metallization Microstructure on fluxless soldering", Journal of Electronic Material, vol. 28, no. 6, PP533-539, 1994
    • (1994) Journal of Electronic Material , vol.28 , Issue.6 , pp. 533-539
    • Cinque, R.B.1    Morris, J.R.J.W.2
  • 2
    • 0343207835 scopus 로고
    • Fluxless C4 Joints and Reflow without Degradation
    • Dec
    • D. Chance "Fluxless C4 Joints and Reflow without Degradation", IBM Tech. Disc. Bul. vol23, no7, pp2990, Dec. 1980.
    • (1980) IBM Tech. Disc. Bul , vol.23 , Issue.7 , pp. 2990
    • Chance, D.1
  • 6
    • 85049515893 scopus 로고
    • Principles, Published by Institute of Physics Publishing Bristol and Philadelphia
    • J. Recce Roth, Industrial Plasma Engineering, vol. 1 Principles, Published by Institute of Physics Publishing Bristol and Philadelphia. 1995
    • (1995) Industrial Plasma Engineering , vol.1
    • Roth, J.R.1
  • 10
    • 77951864094 scopus 로고
    • Thesis Department of Electronic and Electrical Enghineering, University of Surrey, Guildford, Surrey, UK
    • C. J Robertson "Factors Controlling Etch Anisotropyh in Plasmas" Thesis, Department of Electronic and Electrical Enghineering, University of Surrey, Guildford, Surrey, UK. 1990.
    • (1990) Factors Controlling Etch Anisotropyh in Plasmas
    • Robertson, C.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.