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Volumn 762, Issue , 2003, Pages 345-350

Hole Drift-Mobility Measurements in Contemporary Amorphous Silicon

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BAND STRUCTURE; CRYSTALLINE MATERIALS; DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRON MOBILITY; ELECTRON TRAPS; ETCHING; HOLE MOBILITY; HYDROGENATION; PHOTOCURRENTS; SCHOTTKY BARRIER DIODES;

EID: 1642561592     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-762-a7.1     Document Type: Conference Paper
Times cited : (14)

References (7)
  • 3
    • 0030563550 scopus 로고    scopus 로고
    • Ganguly's hole drift-mobility measurements are consistent with later measurements on the same materials by P. Rao at Syracuse University (private communication)
    • G. Ganguly and A. Matsuda, J. Non-Cryst. Solids 198-200, 1003 (1996); Ganguly's hole drift-mobility measurements are consistent with later measurements on the same materials by P. Rao at Syracuse University (private communication).
    • (1996) J. Non-cryst. Solids , vol.198-200 , pp. 1003
    • Ganguly, G.1    Matsuda, A.2
  • 5
    • 0343284090 scopus 로고
    • equation (6)
    • 0 = kT/(1-α) that obtains from the assumption that the valence band edge lies within the exponential bandtail (E. A. Schiff, Solar Energy Materials and Solar Cells, in press (2003).
    • (1981) Phys. Rev. B , vol.24 , pp. 6189
    • Schiff, E.A.1
  • 6
    • 0037397345 scopus 로고    scopus 로고
    • in press
    • 0 = kT/(1-α) that obtains from the assumption that the valence band edge lies within the exponential bandtail (E. A. Schiff, Solar Energy Materials and Solar Cells, in press (2003).
    • (2003) Solar Energy Materials and Solar Cells
    • Schiff, E.A.1
  • 7
    • 0027848008 scopus 로고
    • edited by E. A. Schiff, et al (Materials Research Society, Symposium Proceedings Pittsburgh)
    • Q. Gu, E. A. Schiff, J.-B. Chevrier, and B. Equer, in Amorphous Silicon Technology - 1993, edited by E. A. Schiff, et al (Materials Research Society, Symposium Proceedings Vol. 297, Pittsburgh, 1993), pp. 425-430.
    • (1993) Amorphous Silicon Technology - 1993 , vol.297 , pp. 425-430
    • Gu, Q.1    Schiff, E.A.2    Chevrier, J.-B.3    Equer, B.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.