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Volumn 95-96, Issue , 2004, Pages 117-122
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Nitrogen Out-Diffusion from Czochralski Silicon Monitored by Depth Profiles of Shallow Thermal Donors
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Author keywords
Nitrogen; Out Diffusion; Oxygen; Silicon; Thermal Donors
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Indexed keywords
ANNEALING;
COMPLEXATION;
CONCENTRATION (PROCESS);
CRYSTAL GROWTH FROM MELT;
CRYSTAL IMPURITIES;
DIFFUSION IN SOLIDS;
DIMERS;
DISSOCIATION;
DOPING (ADDITIVES);
MONOMERS;
NITROGEN;
OXIDATION;
PRECIPITATION (CHEMICAL);
QUENCHING;
INTERSTITIAL STATES;
OUT-DIFFUSION PROFILES;
SILICON;
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EID: 1642557049
PISSN: 10120394
EISSN: None
Source Type: Book Series
DOI: None Document Type: Conference Paper |
Times cited : (7)
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References (6)
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