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Volumn 95-96, Issue , 2004, Pages 117-122

Nitrogen Out-Diffusion from Czochralski Silicon Monitored by Depth Profiles of Shallow Thermal Donors

Author keywords

Nitrogen; Out Diffusion; Oxygen; Silicon; Thermal Donors

Indexed keywords

ANNEALING; COMPLEXATION; CONCENTRATION (PROCESS); CRYSTAL GROWTH FROM MELT; CRYSTAL IMPURITIES; DIFFUSION IN SOLIDS; DIMERS; DISSOCIATION; DOPING (ADDITIVES); MONOMERS; NITROGEN; OXIDATION; PRECIPITATION (CHEMICAL); QUENCHING;

EID: 1642557049     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper
Times cited : (7)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.