Synthesis and characterization of novel negative-working aqueous base developable photosensitive polyimide precursors

Polymer

Volumn 45, Issue 4, 2004, Pages 1101-1109

  Hsu, Steve Lien Chung ^a   Fan, Ming Hsin ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Aqueous base; Photosensitive; Polyimide precursor

Indexed keywords

CROSSLINKING; ESTERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; NUCLEAR MAGNETIC RESONANCE; POLYMERIZATION; VISCOSITY;

MOLECULAR DESIGNING;

POLYMERS;

2 HYDROXYETHYL METHACRYLATE; 2,2' BIS(3 AMINO 4 HYDROXYPHENYL)HEXAFLUOROPROPANE; 4,4' DIAMINODIPHENYL ETHER; ACID ANHYDRIDE; ACRYLIC ACID DERIVATIVE; ETHER DERIVATIVE; HYDROXYL GROUP; KETONE DERIVATIVE; PHENYL GROUP; PHENYLPHOSPHONIC DICHLORIDE; POLYIMIDE; PROPANE; PYROMELLITIC DIANHYDRIDE; SULFONE DERIVATIVE; TRIBROMOMETHYLPHENYL SULFONE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; CONCENTRATION (PARAMETERS); CROSS LINKING; INFRARED SPECTROSCOPY; PHOTOSENSITIVITY; POLYMERIZATION; PRECURSOR; PROTON NUCLEAR MAGNETIC RESONANCE; SOLUBILITY; STRUCTURE ANALYSIS; SYNTHESIS; VISCOSITY;

POLYMER SCIENCE; PRECURSOR;

EID: 1642554686     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2003.12.017     Document Type: Article

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