Development of a next generation e-beam lithography system for 1Gbit DRAM masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 313-325

  Komagata, T ^a   Nakagawa, Y ^a   Takemura, H ^a   Gotoh, N ^a   Tanaka, K ^a  

^a JEOL LTD   (Japan)

Author keywords

20 bit D to a converter; Beam shot correction; Electron beam lithography; Mask; Space charge effect

Indexed keywords

CURVE FITTING; DIGITAL TO ANALOG CONVERSION; DYNAMIC RANDOM ACCESS STORAGE; ELECTRIC POTENTIAL; ELECTRIC SPACE CHARGE; MASKS;

BEAM SHOT CORRECTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032402405     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309585     Document Type: Conference Paper

References (1)

1. Development of electron beam optical column for mask lithography system