Effect of pressure on the behavior of cathode spots in oxide removal by arc discharge

Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV

Volumn 2, Issue , 2004, Pages 587-590

  Takahashi, H ^a   Nakamura, T ^a   Sugimoto, M ^a   Takeda, K ^a   Usio, M ^b   Tanaka, M ^b  

^a AKITA PREFECTURAL UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARC DISCHARGE; CATHODE SPOTS; ENERGY DENSITY; OXIDE REMOVAL;

ELECTRIC POTENTIAL; EVAPORATION; PLASMAS; SURFACE CLEANING; SURFACE TREATMENT; VACUUM; VIDEO CAMERAS;

CATHODES;

EID: 16244405256     PISSN: 10932941     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/DEIV.2004.1422684     Document Type: Conference Paper

References (3)

1. K. Takeda, S, Takeuchi, J. Japan Inst. Metals, Vol. 63, No1 (1999), 41-47
2. K. Takeda, S. Takeuchi, thin solid films 407 (2002) 163.
3. K. Takeda, Surface and Coatings Technology 131 (2000) 234-238