Electrochemical behavior of poly(ferrocenyldimethylsilane-b- dimethylsiloxane) films

Journal of Physical Chemistry B

Volumn 109, Issue 10, 2005, Pages 4624-4630

  Chen, Tao ^a   Wang, Li ^a   Jiang, Guohua ^a   Wang, Jianjun ^a   Dong, Xiaochen ^a   Wang, Xuejie ^a   Zhou, Junfeng ^a   Wang, Chiliang ^a   Wang, Wei ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CYCLIC VOLTAMMETRY; DIFFUSION; ELECTROCHEMISTRY; ELECTRODES; ELECTRON TRANSITIONS; GEL PERMEATION CHROMATOGRAPHY; MOLECULAR WEIGHT; POLYMERIZATION; PORE SIZE; REACTION KINETICS; REFRACTIVE INDEX;

ELECTROCHEMICAL PROCESSES; FILM THICKNESS; GLASSY CARBON ELECTRODE; POLYFERROCENYLSILANE FILMS;

THIN FILMS;

EID: 15944414508     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0461246     Document Type: Article

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