Tunable waveguides via photo-oxidation of plasma-polymerized organosilicon films

Applied Optics

Volumn 44, Issue 9, 2005, Pages 1691-1697

  Lock, John P ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CROSSLINKING; LIGHT PROPAGATION; PHOTONS; PHOTOOXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA FILLED WAVEGUIDES; PLASMA POLYMERIZATION; REFRACTIVE INDEX; ULTRAVIOLET RADIATION;

DIMETHYLSILANE; MICROFABRICATION; ORGANOSILICON FILMS; TUNABLE WAVEGUIDES;

SILICON;

EID: 15944373522     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.44.001691     Document Type: Article

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