HIO3 in the presence of wet SiO2: A mild and efficient reagent for selective oxidation of sulfides to sulfoxides under solvent-free conditions

Synthetic Communications

Volumn 35, Issue 6, 2005, Pages 775-784

  Lakouraj, M M ^a   Tajbakhsh, M ^a   Shirini, F ^b   Tamami, M V Asady ^a  

^a UNIVERSITY OF MAZANDARAN   (Iran)

^b UNIVERSITY OF GUILAN   (Iran)

Author keywords

HIO3 wet SiO2; Selective oxidation; Solvent free; Sulfide; Sulfoxide

Indexed keywords

FUNCTIONAL GROUP; SILICON DIOXIDE; SOLVENT; SULFIDE; SULFOXIDE;

ARTICLE; EVAPORATION; OXIDATION; ROOM TEMPERATURE; SOLID; SYNTHESIS; THIN LAYER CHROMATOGRAPHY;

EID: 15944362267     PISSN: 00397911     EISSN: None     Source Type: Journal    
DOI: 10.1081/SCC-200050940     Document Type: Article

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