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Volumn 38, Issue 6, 2005, Pages 922-929

The effect of dielectric barrier discharge configuration on the surface modification of aromatic polymers

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRODES; OPTIMIZATION; STAINLESS STEEL; SURFACE ROUGHNESS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 15744382507     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/6/022     Document Type: Article
Times cited : (24)

References (29)
  • 2
    • 15744396468 scopus 로고
    • Process for producing hydroxylated plasma-polymerized films and the use of the films for enhancing die compatibility of biomedical implants US Patent 5,112,457
    • Marchant R 1992 Process for producing hydroxylated plasma-polymerized films and the use of the films for enhancing die compatibility of biomedical implants US Patent 5,112,457
    • (1992)
    • Marchant, R.1
  • 3
    • 15744375001 scopus 로고    scopus 로고
    • Method of forming adherent metal components on a polyimide substrate US Patent 6,184,076
    • Matienzo L, Blackwell K, Egitto F and Knoll A 2001 Method of forming adherent metal components on a polyimide substrate US Patent 6,184,076
    • (2001)
    • Matienzo, L.1    Blackwell, K.2    Egitto, F.3    Knoll, A.4
  • 4
    • 15744369358 scopus 로고    scopus 로고
    • Process for sterilization using an atmospheric pressure glow discharge plasma source US Patent 6,730,238
    • Li K and Tanielian M 2004 Process for sterilization using an atmospheric pressure glow discharge plasma source US Patent 6,730,238
    • (2004)
    • Li, K.1    Tanielian, M.2
  • 5
    • 15744370628 scopus 로고    scopus 로고
    • Atmospheric pressure inductive plasma apparatus US Patent 6,686,558
    • Selitser S 2004 Atmospheric pressure inductive plasma apparatus US Patent 6,686,558
    • (2004)
    • Selitser, S.1
  • 6
    • 15744397150 scopus 로고    scopus 로고
    • Dielectric barrier discharge apparatus and process for treating a substrate US Patent 6,664,737
    • Berry I, Janos A and Colson M 2003 Dielectric barrier discharge apparatus and process for treating a substrate US Patent 6,664,737
    • (2003)
    • Berry, I.1    Janos, A.2    Colson, M.3
  • 7
    • 15744395599 scopus 로고    scopus 로고
    • Plasma deposition method and system US Patent 6,767,829
    • Akahori T 2004 Plasma deposition method and system US Patent 6,767,829
    • (2004)
    • Akahori, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.