Selective emitters diffusion using an air belt furnace

EPJ Applied Physics

Volumn 30, Issue 1, 2005, Pages 3-6

  Mouhoub, A ^a   Benyahia, B ^a   Mahmoudi, Br ^a  

^a L'Unite de Developpement de la Technologie du Silicium   (Algeria)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); ELECTRIC RESISTANCE; PHOTOVOLTAIC CELLS; SILICON WAFERS; SINGLE CRYSTALS; SOLAR CELLS; THERMOANALYSIS;

CHEMICAL COMPOSITION ANALYSIS; CHEMICAL DEPTH; DOPANT PROFILING; SELECTIVE EMITTERS; SURFACE PASSIVATION;

DIFFUSION;

EID: 15744367380     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2005014     Document Type: Article

References (7)

1. J. Coppye, E. Demesmaeker, H.E. Elgamel, J. Szlufcik, M. Ghannam, Non conventional emitters for polycrystalline silicon solar cells, Proc. of 10th EPSEC, 1991, p. 657
2. J. Horzel, J. Szlufcik, J. Nijs, R. Mertens, A simple processing sequence for selective emitters, Proc. of 14th EPSEC, 1997, p. 61
3. L.M. Porter, A. Teicher, D.L. Meier, Sol. Energy Mater. Sol. Cells 73, 209 (2002)
4. M. Hilali, J.W. Jeong, A. Rohatgi, D.L. Meier, A.F. Carroll, Optimization of self-doping Ag paste firing to achieve high fill factors on screen printed silicon solar cells with a 100 Ω/sq. emitter, Proc. of 29th IEEEPVSC, 2002
5. D.S. Ruby, P. Yang, M. Roy, S. Narayanan, Recent progress on the self-aligned, selective-emitter silicon solar cell, Proc. of 26th IEEEPVSC, 1997
6. A. Mouhoub, B. Mahmoudi, A. Mougas, Photopiles solaires au silicium semicristallin, Actes du colloque CHEMSS 2000, Blida, 13-15 Mai, 2000, p. 444
7. K. Schroder, L. Meier, IEEE T. Electron Dev. 31, 637 (1984)