Negative-working photoresist based on a first-generation dendrimer consisting of 4,4-Diphenylpentyloxy units

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 43, Issue 6, 2005, Pages 1210-1215

  Kamimura, Yasushi ^a,c   Haba, Osamu ^a   Endo, Takeshi ^a   Ueda, Mitsuru ^b  

^a YAMAGATA UNIVERSITY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c Sekisui Seikei Ltd   (Japan)

Author keywords

Alkaline developable; Crosslinking; Dendrimers; Negative working; Photoresists

Indexed keywords

CROSSLINKING; DENDRIMERS; MOLECULAR STRUCTURE; ORGANIC COMPOUNDS; PHENOLS; ULTRAVIOLET RADIATION;

ALKALINE SOLUTIONS; ALKALINE-DEVELOPABLE; NEGATIVE-WORKING; SOLUBILIZATION;

PHOTORESISTS;

EID: 15544386460     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.20608     Document Type: Article

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