Zn1-xCdxO thin films prepared by DC reactive magnetron sputtering

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 24, Issue 10, 2003, Pages 1053-1056

  Ma, Dewei ^a   Ye, Zhizhen ^a   Huang, Jingyun ^a   Zhao, Binghui ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Bandgap; Magnetron sputtering; Zn1 xCdxO films

Indexed keywords

CRYSTAL STRUCTURE; FILM PREPARATION; MAGNETRON SPUTTERING; SEMICONDUCTING CADMIUM COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS;

BANDGAP; DIRECT CURRENT REACTIVE MAGNETRON SPUTTERING; GLASS SUBSTRATES; HIGHLY ORIENTED ZINC CADMIUM OXIDE THIN FILMS; OPTICAL BAND EDGE;

SEMICONDUCTING FILMS;

EID: 1542607724     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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