Particle-electrode surface interaction during nickel electrodeposition from suspensions containing SiC and SiO2 particles

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 235, Issue 1-3, 2004, Pages 45-55

  Socha, Robert P ^a,b   Nowak, Pawel ^b   Laajalehto, Kari ^a   Väyrynen, Juhani ^a  

^a UNIVERSITY OF TURKU   (Finland)

^b INSTITUTE OF CATALYSIS AND SURFACE CHEMISTRY   (Poland)

Author keywords

Hydrophobic hydrophilic particles properties; Ni crystal preferential orientation; Ni electrochemical deposition; SiC and SiO2 particles interaction with Ni surface

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPACITANCE; ELECTRODEPOSITION; GRAIN GROWTH; HYDROPHILICITY; HYDROPHOBICITY; NICKEL; SILICON CARBIDE; X RAY DIFFRACTION ANALYSIS;

SOILD PARTICLES; SURFACE INTERACTIONS;

SILICA;

NICKEL; SILICON CARBIDE; SILICON DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; ELECTRIC CAPACITANCE; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTRODE; HYDROPHILICITY; MOLECULAR INTERACTION; PARTICULATE MATTER; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SUSPENSION; X RAY DIFFRACTION;

EID: 1542407837     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2004.01.011     Document Type: Article

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