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Volumn 96, Issue 1-3, 2002, Pages 193-211
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Thin wetting films from aqueous electrolyte solutions on SiC/Si wafer
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Author keywords
Disjoining pressure; Microinterferometric thickness measurement; Silicon carbide; Thin wetting films
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Indexed keywords
COAGULATION;
INTERFEROMETRY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON CARBIDE;
SILICON WAFERS;
SOLUTIONS;
SUBSTRATES;
SURFACE CHEMISTRY;
THICKNESS MEASUREMENT;
THIN FILMS;
THIN WETTING FILMS;
ELECTROLYTES;
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EID: 0037169952
PISSN: 00018686
EISSN: None
Source Type: Journal
DOI: 10.1016/S0001-8686(01)00081-1 Document Type: Review |
Times cited : (41)
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References (38)
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