The role of laser surface patterning for enhanced optical absorptance of ‘black silicon’

Journal of Modern Optics

Volumn 50, Issue 2, 2003, Pages 185-197

  Harmer, S ^a   Townsend, P D ^a  

^a UNIVERSITY OF SUSSEX   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; LIGHT ABSORPTION; MATHEMATICAL MODELS; MICROSTRUCTURE; PERMITTIVITY; PHOTONS; POLARIZATION; PULSED LASER APPLICATIONS; REFLECTION; SURFACE PHENOMENA;

BAND GAP ENERGY; LASER SURFACE PATTERNING;

SILICON;

EID: 1542366458     PISSN: 09500340     EISSN: 13623044     Source Type: Journal    
DOI: 10.1080/09500340308235169     Document Type: Article

References (6)

1. Her, T. H., Finlay, R. J., Wu, C., and Mazur, E., 2000. Appl. Phys. A, 70:393
2. Wu, C., Crouch, C. H., Zhao, L., Carey, J. E., Younkin, R., Levinson, J. A., and Mazur, E., 2001. Appl. Phys. Lett., 13:1850
3. Wilson, S. J., and Hutley, M. C., 1982. Optica Acta, 29:993
4. CRC Handbook of Chemistry and Physics ”. 80th edn 12–107–12–132.
5. Aspnes, D. E., and Studna, A. A., 1983. Phys. Rev. B, 27:985
6. Harmer, S. W., 2000. “ Enhanced Absorptance Photocathodes ”. In DPhil thesis Sussex