OBIRCH - Monitoring As A Reliability-Failure-Analysis and Screening Tool

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2001, Pages 397-403

  Jacob, Peter ^a,b   Beaudoin, Félix ^c  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b EM Microelectronic   (Switzerland)

^c CNES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC RESISTANCE; FAILURE ANALYSIS; INFRARED RADIATION; ION BEAMS; METALLIZING; PROCESS CONTROL; THERMOELECTRICITY;

FOCUSED ION BEAMS (FIB); SCREENING TOOLS;

OPTICAL DEVICES;

EID: 1542360495     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. Kiyoshi Nikawa and Shoji Tozaki, ISTFA proceedings 1993 (ASM International), pp.303-310
2. Kiyoshi Nikawa and Shoij Inoue, "LSI failure analysis using focused laser beam heating" ESREF proceedings 1995 (Adera, France), pp. 307-312
3. Kiyoshi Nikawa, Kazuyuki Morimoto and Shoji Inoue, "Failure analysis using the IR-OBIRCH method", NEC Res&Developm. Vol 41, No.4, Oct. 2000