Capacitive Pressure and Inertial Sensors by EPI-SOI Surface Micromachining

Proceedings of IEEE Sensors

Volumn 1, Issue 2, 2002, Pages 1385-1388

  Renard, Stéphane ^a   Pisella, Christian ^a   Collet, Joel ^a   Gaff, Vincent ^a   Lauront, Jean Louis ^a  

^a Tronic’s Microsystems ^*  (France)

Author keywords

Acceleration; Epi SOI; Medical; MEMS; Pressure; Surface micromachining

Indexed keywords

ACCELEROMETERS; CAPACITANCE; CRYSTAL GROWTH; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROSTRUCTURE; SEISMOLOGY; SIGNAL TO NOISE RATIO; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; SINGLE CRYSTALS;

CAPACITIVE ACCELEROMETERS; SURFACE MICROMACHINING;

CHEMICAL SENSORS;

EID: 1542331378     PISSN: 19300395     EISSN: 21689229     Source Type: Journal    
DOI: 10.1109/ICSENS.2002.1037323     Document Type: Article

References (4)

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