Discharge efficiency in high-Xe-content plasma display panels

Journal of Applied Physics

Volumn 95, Issue 4, 2004, Pages 1656-1661

  Hayashi, Daiyu ^a   Heusler, Gero ^a   Hagelaar, Gerjan ^b   Kroesen, Gerrit ^b  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER SIMULATION; ELECTRIC DISCHARGES; ELECTRON ENERGY LEVELS; PERFORMANCE; PLASMA COLLISION PROCESSES; PLASMAS; ULTRAVIOLET RADIATION; XENON;

DISCHARGE EFFICIENCY; HIGH XENON CONTENT PLASMA DISPLAY PANELS; RESONANT RADIATION; TWO DIMENSIONAL FLUID MODEL;

PLASMA DISPLAY DEVICES;

EID: 1542306889     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1641961     Document Type: Article

References (25)

1. J.-P. Boeuf, J. Phys. D 36, R53 (2003)
2. A. Sobel, IEEE Trans. Plasma Sci. 19, 1032 (1991).
3. L. Weber, in Flat-Panel Displays and CRTs, edited by L. Tannas (van Nostrand Reinhold, New York, 1985) pp. 332-407.
4. J. Meunier, P. Belenguer, and J. P. Boeuf, J. Appl. Phys. 78, 731 (1995).
5. G. J. M. Hagelaar, M. H. Klein, R. J. M. M. Snijkers, and G. M. W. Kroesen, J. Appl. Phys. 89, 2033 (2001).
6. H. Gläser, H. Bechtel, T. Jüstel, and D. U. Wiechert, J. Soc. Inf. Disp. 8, 189 (2000).
7. T. Komaki, H. Taniguchi, and K. Amemiya, Proc. of IDW'99 (1999), p. 587.
8. O. Toyoda, T. Kosaka, F. Namiki, A. Tokai, H. Inoue, and K. Betsui, in Proc. of IDW'99 (1999), p. 599.
9. J. F. Waymouth, Electric Discharge Lamps (M. I. T. Press, Massachusetts, 1971).
10. B. Eliasson and U. Kogelschatz, Appl. Phys. B: Photophys. Laser Chem. 46, 299 (1988).
11. V. I. Kolobov and L. D. Tsendin, Phys. Rev. A 46, 7837 (1992).
12. T. Yoshikawa, A. Miyakoshi, A. Okigawa, E. Mizobata, and K. Toki, in Proc. of IDW'00 (2000), p. 611.
13. G. Oversluizen, S. de Zwart, S. van Heusden, and T. Dekker, Proc. of IDW'00 (2000), p. 631.
14. G. J. M. Hagelaar and G. M. W. Kroesen, IEEE Trans. Plasma Sci. 27, 1606 (1999)
15. G. J. M. Hagelaar and G. M. W. Kroesen, J. Comput. Phys. 159, 1 (2000)
16. G. J. M. Hagelaar, Ph.D. thesis, (Eindhoven University of Technology, Eindhoven, 2000).
17. G. J. M. Hagelaar, F. J. de Hoog, and G. M. W. Kroesen, Phys. Rev. E 62, 1452 (2000).
18. T. Holstein, Phys. Rev. 72, 1212 (1947).
19. G. J. M. Hagelaar and G. M. W. Kroesen, Plasma Sources Sci. Technol. 9, 605 (2000).
20. E. H. Choi, J. C. Ahn, M. W. Moon, Y. M. C. Choi, Y. Seo, G. Cho, H. S. Uhm, K. Tachibana, K. W. Whang, and M. Kristiansen, Appl. Phys. Lett. 81, 3341 (2002).
21. M. F. Gillies and G. Oversluizen, J. Appl. Phys. 91, 6315 (2002).
22. K. Tachibana and S. Feng, J. Appl. Phys. 88, 4967 (2000).
23. S. Rauf and M. J. Kushner, J. Appl. Phys. 85, 3470 (1999).
24. P. V. Feltsan and I. P. Zapesochny, Ukr. Fiz. Zh. 13, 205 (1968).
25. V. Puech and S. Mizzi, J. Phys. D 24, 1974 (1991).