Density Functional Study of XH4 (X=Si and Ge) Reactivity upon Dissociative Adsorption Onto the Si(100) Surface

International Journal of Quantum Chemistry

Volumn 97, Issue 2, 2004, Pages 736-746

  Lin, Jyh Shing ^a   Lee, Lien Feng ^a  

^a TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Density functional theory; Germane; Silane; Silicon surface; Ultrasoft pseudopotential

Indexed keywords

ADSORPTION; APPROXIMATION THEORY; DISSOCIATION; ELECTRONIC STRUCTURE; ENERGY GAP; GERMANIUM ALLOYS; KINETIC ENERGY; MATHEMATICAL MODELS; MICROELECTRONICS; MOLECULAR BEAMS; PROBABILITY DENSITY FUNCTION; SILANES;

SILICON SURFACES; ULTRASOFT PSEUDOPOTENTIALS;

SILICON ALLOYS;

EID: 1542273636     PISSN: 00207608     EISSN: None     Source Type: Journal    
DOI: 10.1002/qua.10780     Document Type: Article

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