TEM Direct Observation of Gate Oxide Defects

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2002, Pages 765-769

  Wang, Nathan ^a   Daniel, Sabbas ^a  

^a CYPRESS SEMICONDUCTOR   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GATE OXIDE DEFECTS; PASSIVE VOLTAGE CONTRAST (PVC); SECONDARY ELECTRON MICROSCOPE (SEM);

CRYSTAL DEFECTS; ETCHING; FAILURE ANALYSIS; ION BEAMS; PHOTONS; POLYSILICON; SCANNING ELECTRON MICROSCOPY; TRANSISTORS; TRANSMISSION ELECTRON MICROSCOPY;

CMOS INTEGRATED CIRCUITS;

EID: 1542270247     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)

1. J. Segura and A. Rubio, IEEE J. of Solid-State Circuits, 32, No.10, Oct. 1543, (1997)
2. G. T. Gabriel, J. Vac. Sci. Technol. A 17(4), Jul/Aug, 1494 (1999)
3. M. Itsumi, Electrochemical Socity Proceedings, Vol. 97-12, 147 (1997)
4. M. Tamatsuka, K. Miki, Solid State Phenomena, Vols. 63-64, 395 (1998)
5. M. Depas, B. Vermeire and M. Heyns, J. Appl. Phys. 80(1), 1 July, 382 (1996)
6. N. Wang, R. Zou, J. Wu and S. Daniel, ISTFA'1999, ASM International, Materials Park, Ohio, 349 (1999)
7. C. Boit, Microelectronic Failure Analysis, ASM International, Materials Park, Ohio, 213 (1999)
8. L. Rice, Microscopy Today, P.8, Dec. (2001)
9. S. Wolf, Silicon Process, Vol.2, 27, Lattice Press, Sunset Beach, California (1990)
10. J. C. Lee, D. Su, J. H. Chuang, Microelectronics Reliability, 41, No. ER9-10, 1551 (2001)
11. T. Yaguchi, Y. Kuroda, Y. Ueki, T. Kamino, K. Umemura and K. Asayama, Microscopy and Microanalysis, Vol.7, No.Supp/2, 938 (2001)
12. J. C. Reiner, Electrical overstress/Electrostatic Discharge Symposium Proceedings, 311 (1995)