Characterization of heat- and photo- annealed GeXas 40-XS60 films by X-ray photoelectron spectroscopy

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 1, 2005, Pages 353-356

  Debnath, R K ^a   Fitzgerald, A G ^a   Christova, K ^b   Manov, A ^b  

^a UNIVERSITY OF DUNDEE   (United Kingdom)

^b INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Amorphous film; Heat annealing; Photo annealing; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ANNEALING; ANTIMONY COMPOUNDS; BINDING ENERGY; BONDING; CHARACTERIZATION; GERMANIUM COMPOUNDS; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL BONDING STRUCTURE; HEAT ANNEALING; LOOSER FILM STRUCTURE; PHOTO ANNEALING;

PHOTOSENSITIVE GLASS;

EID: 15244342439     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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