Electroless plating of copper through successive pretreatment with silane and colloidal silver

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 257-258, Issue , 2005, Pages 283-286

  Liu, Zheng Chun ^a,b   He, Quan Guo ^b   Hou, Peng ^b   Xiao, Peng Feng ^b   He, Nong Yue ^b   Lu, Zu Hong ^b  

^a HUNAN UNIVERSITY OF TECHNOLOGY   (China)

^b SOUTHEAST UNIVERSITY   (China)

Author keywords

Colloidal Ag; Electroless copper plating; Self assembled molecular layer

Indexed keywords

ACTIVATION ANALYSIS; COLLOIDS; COPPER; DEPOSITION; GLASS; METALLIC FILMS; PALLADIUM COMPOUNDS; SELF ASSEMBLY; SILANES; SILVER;

COLLOIDAL SILVER; COPPER FILMS; MERCAPTOPROPYLTRIMETHOXYSILANE (MPTS); PRETREATMENT;

ELECTROLESS PLATING;

COPPER; GLASS; LEAD CHLORIDE; SILANE; SILVER; SILVER DERIVATIVE; STANNOUS CHLORIDE; SULFUR;

CHEMICAL BINDING; CHEMICAL BOND; COLLOID; CONFERENCE PAPER; ELECTROPLATING INDUSTRY; FILM; METAL BINDING; PRIORITY JOURNAL; REACTION ANALYSIS; SENSITIZATION; SOLID; SURFACE PROPERTY;

EID: 15044357451     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2004.10.036     Document Type: Conference Paper

References (19)

1. W. Riedel Electroless Nickel Plating 1991 Finishing Publications Metals Park Chapters 1, 3 and 9
2. S.D. Yosi, D. Valery, and A. Matthew Thin Solid Films 262 1995 93
3. G. Muller, and D.W. Baudrand Plating on Plastics: A Practical Handbook 1971 Robert Draper Ltd. Teddington
4. H. Ebneth Metallizing of plastics R. Suchentrunk Handbook of Theory and Practice vol. 30 1993 ASM International Materials Park 30
5. R.L. Meek J. Electrochem. Soc. 122 1975 1478
6. P.C. Yen Polymer 36 1995 3399
7. M. Charbonnier, and M. Romand Surf. Coat. Technol. 162 2002 19
8. G.H. Yang, E.T. Kang, and K.G. Neoh Langmuir 17 2001 211
9. Z.J. Yu, E.T. Kang, and K.G. Neoh Langmuir 18 2002 10221
10. Z.C. Liu, Q.G. He, J.X. Tang, P.F. Xiao, N.Y. He, and Z.H. Lu Chin. J. Chem. 1 2003 1
11. J.W. Hill, D.L. Foss, and L.W. Scott J. Chem. Educ. 56 11 1979 752
12. S. Shukla, S. Seal, Z. Rahaman, and K. Scammon Mater. Lett. 57 2002 151
13. J.F. Liu, L.G. Zhang, N. Gu, J.Y. Ren, Y.P. Wu, Z.H. Lu, P.S. Mao, and D.Y. Chen Thin Solid Films 327 1998 176
14. W.P. Qian, B. Xu, Z.D. Song, L. Wu, D.F. Yao, F. Yu, Z.H. Lu, and Y. Wei Mol. Cryst. Liq. Cryst. 337 1999 277
15. Z.C. Liu, Q.G. He, P.F. Xiao, B. Liang, J.X. Tang, N.Y. He, and Z.H. Lu Mater. Chem. Phys. 82 2003 301
16. K.C. Grabar, R.G. Freeman, M.B. Hommer, and M.J. Natan Anal. Chem. 67 1995 735
17. L. Ralf, C. Maria, Y.I. Nancy, and J.S. Nikolaus Langmuir 17 2001 2497
18. P.E. Laibinis, G.M. Whitesides, D.L. Allara, Y.T. Tao, A.N. Parikh, and R.G. Nuzzo J. Am. Chem. Soc. 113 1991 7152
19. R.D. Marco, R.W. Cattrall, J. Liesegang, G.L. Nyberg, and I.C. Hamilton Anal. Chem. 62 1990 2339