Self-assembly films of tetrakis(hydroxyphenyl) porphyrins

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 257-258, Issue , 2005, Pages 291-294

  Zhang, Hong ^a   Ma, Ye ^a   Lu, Zuhong ^a,c   Gu, Zhong Ze ^a,b  

^a SOUTHEAST UNIVERSITY   (China)

^b NANJING UNIVERSITY   (China)

^c NANJING UNIVERSITY   (China)

Author keywords

Porphyrins; Self assembly films; Tetrakis(hydroxyphenyl)

Indexed keywords

ATOMIC FORCE MICROSCOPY; DERIVATIVES; MICA; MOLECULAR STRUCTURE; MORPHOLOGY; PORPHYRINS; SILICON WAFERS; SUBSTRATES;

HYDROXYPHENYL SUBSTITUTED PORPHYRINS; PORPHYRIN DERIVATIVES; SELF-ASSEMBLY FILMS;

SELF ASSEMBLY;

MICA; PORPHYRIN DERIVATIVE; SILICON;

ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; CONCENTRATION PROCESS; CONFERENCE PAPER; MICROFILM; MOLECULAR STABILITY; PRIORITY JOURNAL; PROCESS DEVELOPMENT; STRUCTURE ANALYSIS; SUBSTITUTION REACTION; SURFACE PROPERTY;

EID: 15044342565     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2004.10.092     Document Type: Conference Paper

References (13)

1. S.I. Stupp, and P.V. Braun Science 277 1997 1242 1253
2. J.L. Sessler Isr. J. Chem. 32 1992 449 467 and references therein
3. G. Steinberg-Yfrach, P.A. Liddell, S. Hung, A.L. Moore, D. Gust, and T.A. Moore Science 385 1997 239 241
4. C.T. Buscher, D. McBranch, and D. Li J. Am. Chem. Soc. 118 1996 2950 2953
5. H. Chen, M.S. Farahat, K.-Y. Law, and D.G. Whitten J. Am. Chem. Soc. 118 1996 2584 2594
6. L.A. Bumm, J.J. Arnold, M.T. Cygan, T.D. Dunbar, T.P. Burgin, L. Jones II, D.L. Allara, J.M. Tour, and P.S. Weiss Science 271 1996 1705 1707
7. H. Korner, A. Shiota, T.J. Bunning, and C.K. Ober Science 272 1996 252 255
8. G. Decher Science 277 1997 1232 1237
9. D. Chen, and H. Liu Huaxueshiji 13 3 1991 149 152
10. H.A.M. Biemans, A.E. Rowan, A. Verhoeven, P. Vanoppen, L. Latterini, J. Foekema, A.P.H.J. Schenning, E.W. Meijer, F.C. de Schryer, and R.J.M. Nolte J. Am. Chem. Soc. 120 1998 11054 11060
11. A.P.H.J. Schenning, F.B.G. Benneker, H.P.M. Geurts, X.Y. Liu, and R.J.M. Nolte J. Am. Chem. Soc. 118 1996 8549 8552
12. N.G. Semaltianos, and E.G. Wilson Thin Solid Films 366 2000 111 116
13. N. Nishino, K. Kobata, H. Mihara, and T. Fujimoto Chem. Lett. 1992 1991 1994