Analysis of molecular oxygen formation in irradiated glasses: A Raman depth profile study

Journal of Nuclear Materials

Volumn 340, Issue 2-3, 2005, Pages 209-213

  Ollier, N ^a   Boizot, B ^a   Reynard, B ^b   Ghaleb, D ^c   Petite, G ^a  

^a LABORATOIRE DES SOLIDES IRRADIÉS   (France)

^b CNRS   (France)

^c CEA Marcoule   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRONS; IRRADIATION; PERCOLATION (FLUIDS); POLYMERIZATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; STOICHIOMETRY; X RAY DIFFRACTION;

ALKALI MIGRATION; IRRADIATED GLASSES; MOLECULAR OXYGEN; PEROXY RADICALS;

BOROSILICATE GLASS;

EID: 14844318602     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2004.11.011     Document Type: Article

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