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Volumn 230, Issue 1-4, 2005, Pages 583-588

The effect of microrelief evolution on the angular dependence of polycrystalline Cu sputtering yield

Author keywords

Developed surface topography; High dose ion bombardment; Sputtering

Indexed keywords

COMPUTER SIMULATION; DOSIMETRY; EROSION; GONIOMETERS; ION BOMBARDMENT; PHOTOMETRY; POLYCRYSTALLINE MATERIALS; SPUTTERING; SURFACE TOPOGRAPHY;

EID: 14744292900     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.12.105     Document Type: Conference Paper
Times cited : (7)

References (20)
  • 1
    • 0002309556 scopus 로고    scopus 로고
    • The physics and applications of ion beam erosion
    • G. Carter The physics and applications of ion beam erosion J. Phys. D: Appl. Phys. 34 2001 R1
    • (2001) J. Phys. D: Appl. Phys. , vol.34
    • Carter, G.1
  • 5
    • 0042068078 scopus 로고    scopus 로고
    • Spatial Distributions of Particles Sputtered under Ion Bombardment. III. Oblique Incidence
    • E.S. Mashkova, V.A. Molchanov, and G. Falcone Spatial Distributions of Particles Sputtered under Ion Bombardment. III. Oblique Incidence Surface Investigation 16 2001 1339
    • (2001) Surface Investigation , vol.16 , pp. 1339
    • Mashkova, E.S.1    Molchanov, V.A.2    Falcone, G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.