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Volumn 357, Issue 3-4, 2005, Pages 348-355
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Thermal regime and effect studying on the ablation process of thin films prepared by nanosecond pulsed laser
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Author keywords
Heat diffuse equation; Pulsed laser ablation; Temperature evolvement; Vaporization
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Indexed keywords
COMPUTER SIMULATION;
FINITE DIFFERENCE METHOD;
HEAT FLUX;
INTERFACES (MATERIALS);
LASER ABLATION;
LASER PULSES;
THERMAL DIFFUSION;
THERMAL EFFECTS;
THERMODYNAMIC PROPERTIES;
VAPORIZATION;
HEAT DIFFUSE EQUATION;
PULSED LASER ABLATION;
TEMPERATURE EVOLVEMENT;
THERMODYNAMIC EFFECTS;
THIN FILMS;
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EID: 14644411089
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physb.2004.11.086 Document Type: Article |
Times cited : (20)
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References (21)
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