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Volumn 357, Issue 3-4, 2005, Pages 348-355

Thermal regime and effect studying on the ablation process of thin films prepared by nanosecond pulsed laser

Author keywords

Heat diffuse equation; Pulsed laser ablation; Temperature evolvement; Vaporization

Indexed keywords

COMPUTER SIMULATION; FINITE DIFFERENCE METHOD; HEAT FLUX; INTERFACES (MATERIALS); LASER ABLATION; LASER PULSES; THERMAL DIFFUSION; THERMAL EFFECTS; THERMODYNAMIC PROPERTIES; VAPORIZATION;

EID: 14644411089     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2004.11.086     Document Type: Article
Times cited : (20)

References (21)
  • 16
    • 14644417567 scopus 로고    scopus 로고
    • B. Christensen, M.S. Tillack, University of California, San Diego, La Jolla, 2003
    • B. Christensen, M.S. Tillack, University of California, San Diego, La Jolla, 2003.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.