Dynamic simulation on the preparation process of thin films by pulsed laser

Science in China, Series A: Mathematics, Physics, Astronomy

Volumn 44, Issue 11, 2001, Pages 1485-1496

  Zhang, Duanming ^a   Li, Zhihua ^a   Yu, Boming ^a   Huang, Mingtao ^a   Guan, Li ^a   Zhong, Zhicheng ^b   Li, Guodong ^b  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUBEI UNIVERSITY OF ARTS AND SCIENCE   (China)

Author keywords

Ablation ratio; KTN thin film; Plasma; Pulsed laser deposition (PLD)

Indexed keywords

EID: 0035520476     PISSN: 10069283     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02877078     Document Type: Article

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