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Volumn 45, Issue 5-6, 2005, Pages 915-918
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Light emission from Si/SiO2 superlattices fabricated by RPECVD
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE;
CHARGE CARRIERS;
CRYSTALLIZATION;
ELECTRIC POTENTIAL;
LIGHT EMISSION;
PHOTOLUMINESCENCE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SCATTERING;
RAPID THERMAL ANNEALING;
SEMICONDUCTOR QUANTUM WELLS;
SILICA;
SUPERLATTICES;
TRANSMISSION ELECTRON MICROSCOPY;
CAPACITANCE VOLTAGE (CV);
RAMAN MICROSCOPY;
REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD);
ROOM TEMPERATURE (RT);
SILICON;
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EID: 14644406254
PISSN: 00262714
EISSN: None
Source Type: Journal
DOI: 10.1016/j.microrel.2004.11.025 Document Type: Conference Paper |
Times cited : (22)
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References (13)
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