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Volumn 4, Issue , 2004, Pages 4262-4267

Weighted principal component analysis and its applications to improve FDC performance

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; INTEGRATED CIRCUITS; MATHEMATICAL MODELS; PARAMETER ESTIMATION; PLASMA ETCHING; PROBLEM SOLVING; SENSORS; SIGNAL TO NOISE RATIO;

EID: 14244262619     PISSN: 07431546     EISSN: 25762370     Source Type: Conference Proceeding    
DOI: 10.1109/cdc.2004.1429421     Document Type: Conference Paper
Times cited : (47)

References (16)
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    • Identification of faulty sensors using principal component analysis
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  • 6
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    • Development and benchmarking of multivariate statistical process control tools for a semiconductor etch process; improving robustness through model updating
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    • V.B. Gallagher, R.M. Wise, S.W. Butler, D.D. White, G.G. Barna, "Development and benchmarking of multivariate statistical process control tools for a semiconductor etch process; improving robustness through model updating," in: Proc. of ADCHEM 97, Banff, Canada, June 1997, pp. 78-83.
    • (1997) Proc. of ADCHEM 97 , pp. 78-83
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  • 8
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    • Diagnostics of plasma etch: PCA with adaptive centering and scaling
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    • Monitoring etch tool health using weighted PCA
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    • Contribution plots: The missing link in multivariate quality control
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.