Bulk micromachined tunneling tips integrated with positioning actuators

Journal of Microelectromechanical Systems

Volumn 14, Issue 1, 2005, Pages 23-28

  Mita, Makoto ^a   Kawara, Hiroaki ^a   Toshiyoshi, Hiroshi ^a   Endo, Junji ^a   Fujita, Hiroyuki ^a  

^a JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

Author keywords

Deep reactive ion etching (DRIE); ICP RIE; Microactuators; Scanning tunneling microscopy (STM); Tunneling current

Indexed keywords

ATMOSPHERIC PRESSURE; ELECTRIC CURRENT CONTROL; ELECTRIC CURRENT MEASUREMENT; ELECTROSTATIC ACTUATORS; MICROACTUATORS; MICROMACHINING; REACTIVE ION ETCHING; SCANNING TUNNELING MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

INTEGRATED MICROMECHANICAL SYSTEMS; MICROMACHINED TUNNELING TIPS; POSITIONING ACTUATORS; TUNNELING CURRENT;

MICROELECTROMECHANICAL DEVICES;

EID: 14044249458     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2004.838997     Document Type: Article

References (14)

1. R. L. Kubena, G. M. Atkinson, W. P. Robinson, and F. P. Stratton, "A new miniaturized surface micromachined tunneling accelerometer," J. Vac. Sci. Technol. B, vol. 14, no. 6, Nov./Dec. 1996.
2. J. J. Yao, S. C. Arney, and N. C. MacDonald, "Fabrication of high fequency two-dimensional nanoactuators for scanned probe devices," J. Microelectromech. Syst., vol. 1, pp. 14-22, 1992.
3. T. W. Kenny, S. B. Waltman, J. K. Reynolds, and W. J. Kaise, "Micromachined silicon tunnel sensor for motion detection," Appl. Phys. Lett., vol. 58, no. 1, p. 100, Jan. 1991.
4. T. W. Kenny, W. J. Kaiser, H. K. Rockstad, J. K. Reynolds, J. A. Podosek, and E. C. Vote, "Wide-bandwidth electromechanical actuators for tunneling displacement transducers," J. Microelectromech. Syst. vol. 3, no. 3, pp. 97-104, 1994.
5. M. I. Lutwyche and Y. wada, "Observation of a vacuum tunnel gap in a transmission electron microscope using a micromechanical tunneling microscope," Appl. Phys. Lett., vol. 66, no. 21, pp. 2807-2809, 1995.
6. CREST/JST.. [Online]. Available: http://www.jst.go.jp/crest/
7. D. Kobayashi and H. Fujita, Trans. IEE Japan, vol. 116-E, no. 8, pp. 339-344, 1996.
8. D. Kobayashi et al., "An integrated lateral tunneling unit," in IEEE MEMS 92, Travemunde, Germany, Feb. 4-7, 1992, pp. 214-19.
9. H. Toshiyoshi et al., "Fabrication of micromehanical tunneling probes and actuators on a silicon chip" (in Japanese), J. Appl. Phys., pt. 1, vol. 38, no. 12B, pp. 7185-7189, Dec. 1999.
10. H. Toshiyoshi et al., "Micromechanical tunnelingprobes & actuators on a silicon chip," in 1999 Int. Microprocesses and Nanotechnology Conf., Yokohama, Japan, Jul. 6-8, 1999, 8B-7-2.
11. V. Milanovic et al., "Deep reactive ion etching for lateral field emission device," IEEE Electton Device Lett., vol. 21, no. 6, pp. 271-273, Jun. 2000.
12. G. Hashiguchi and H. Minura, "Fabrication of silicon quantum wires using separation by implanted oxygen wafer" (in Japanese), J. Appl. Phys., pt. 2, vol. 33, no. 12A, pp. 1649-1650, Dec. 1994.
13. M. Mira et al., "Characterization of bulk micromachined tunne ling tip integrated with positioning actuator," in IEEE MEMS 2002 Las Vegas, NV, Jan. 20-25, 2002.
14. M. Mita, H. Kawara, H. Toshiyoshi, M. Ataka, and H. Fujita, "An electrostatic 2-dimensional micro-gripper for nano structure," in Proc. 12th Int. Conf. Solid-State Sensors, Actuators and Microsystems (Transducers 03), vol. 4D1.2, Boston, MA, Jun. 8-12, 2003, pp. 1768-1771.