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Volumn T108, Issue , 2004, Pages 46-56
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Deuterium retention in pure and mixed plasma facing materials
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
MOLECULAR STRUCTURE;
PLASMAS;
SECONDARY ION MASS SPECTROMETRY;
TUNGSTEN COMPOUNDS;
DEUTERIUM RETENTION;
PLASMA FACING MATERIALS;
DEUTERIUM COMPOUNDS;
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EID: 13844317729
PISSN: 02811847
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1238/Physica.Topical.108a00046 Document Type: Conference Paper |
Times cited : (29)
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References (24)
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