Modeling vapor deposition of metal/semiconductor-polymer nanocomposite

Thin Solid Films

Volumn 476, Issue 1, 2005, Pages 190-195

  Song, Hongwei ^a   Ilegbusi, Olusegun J ^a   Trakhtenberg, L I ^b  

^a University of Central Florida   (United States)

^b KARPOV INSTITUTE OF PHYSICAL CHEMISTRY   (Russian Federation)

Author keywords

Condensation; Nanostructure; Physical vapor deposition; Polymer

Indexed keywords

CONDENSATION; LOW TEMPERATURE EFFECTS; MATHEMATICAL MODELS; MONOMERS; NUCLEATION; POLYMERIZATION; POLYMERS; SEMICONDUCTOR MATERIALS; SURFACE ROUGHNESS; VAPOR DEPOSITION;

CLUSTERS; DEPOSITION RATE; MONOMER VAPORS; POLYMER MATRIX;

NANOSTRUCTURED MATERIALS;

EID: 13844310754     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.09.062     Document Type: Article

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