Surface properties and structures of diblock copolymer and homopolymer with perfluoroalkyl side chains

Journal of Colloid and Interface Science

Volumn 283, Issue 2, 2005, Pages 533-538

  Nishino, Takashi ^a   Urushihara, Yoshimasa ^a   Meguro, Masashi ^a   Nakamae, Katsuhiko ^a  

^a KOBE UNIVERSITY   (Japan)

Author keywords

Cast solvent; CF 3 group; Collapse; Diblock copolymer; Hexagonal packing; Perfluoroalkyl side chain; Surface free energy

Indexed keywords

FREE ENERGY; HOMOPOLYMERIZATION; LIGHT SCATTERING; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

HOMOPOLYMERS; SOLID STATE; SURFACE FREE ENERGY; SURFACE SEGREGATION;

BLOCK COPOLYMERS;

ALKYL GROUP; CHLOROFORM; COPOLYMER; PERFLUORO COMPOUND;

ANALYTIC METHOD; ARTICLE; CHEMICAL STRUCTURE; COLLAPSE; COMPARATIVE STUDY; LIGHT SCATTERING; PRIORITY JOURNAL; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUOROCARBONS; METHYLMETHACRYLATE; POLYMERS; POLYMETHACRYLIC ACIDS; POLYMETHYL METHACRYLATE; SURFACE PROPERTIES;

EID: 13844276071     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2004.09.041     Document Type: Article

References (34)

1. W.A. Zisman Adv. Chem. 43 1964 1
2. S.M. Mukhopadhyay, P. Joshi, S. Data, and J. Macdaniel Appl. Surf. Sci. 201 2002 219
3. K. Takahashi, A. Itoh, T. Nakamura, and K. Tachibana Thin Solid Films 372 2000 303
4. K.K.S. Lau, and K.K. Gleason J. Fluorine Chem. 104 1999 574
5. T. Nishino, M. Meguro, and K. Nakamae Int. J. Adhes. Adhes. 19 1999 399
6. J. Genzer, and K. Efimenko Science 290 2000 2130
7. W. Chen, A.Y. Fadeev, M.C. Hsieh, D. Oner, J. Youngblood, and T.J. McCarthy Langmuir 15 1999 3395
8. J.W. Fich, E. Bucio, L. Martinez, J. Macossay, S.R. Venumbaka, N. Dean, D. Stoakley, and P.E. Cassidy Polymer 44 2003 6431
9. H. Hochart, R.D. Jeager, and J.L. Grützmacher Surf. Coat. Technol. 165 2003 201
10. K.H. Choo, and C.H. Lee J. Colloid Interface Sci. 226 2000 367
11. K. Sumiya, T. Taii, K. Nakamae, and T. Matsumoto J. Adhes. Soc. Jpn. 18 1982 345
12. T. Nishino, M. Meguro, K. Nakamae, M. Matsushita, and Y. Ueda Langmuir 15 1999 4321
13. K. Révész, B. Hopp, and Z. Bor Langmuir 13 1982 5593
14. T. Tervoort, J. Vigjager, B. Graf, and P. Smith Macromolecules 33 2000 6460
15. H.G. Elias Macromolecules second ed. 1984 Plenum New York p. 918
16. J.M. DeSimone, Z. Guan, and C.S. Elsbernd Science 257 1992 945
17. I.J. Park, S.B. Lee, C.K. Choi, and K.J. Kim J. Colloid Interface Sci. 181 1996 284
18. J. Wang, G. Mao, C.K. Ober, and E.J. Kramer Macromolecules 30 1997 1906
19. A. Fujimori, T. Araki, H. Nakahara, E. Ito, M. Hara, H. Ishii, Y. Ouchi, and K. Seki Chem. Phys. Lett. 349 2001 6
20. P. Friedel, D. Pospiech, D. Jehnichen, J. Bergmann, and C.K. Ober J. Polym. Sci. Part B: Polym. Phys. 38 2000 1617
21. D. Pospiech, D. Jehnichen, A. Gottwald, L. Häußler, W. Kollig, K. Grundke, A. Janke, S. Schmit, and C. Werner Surf. Coat. Int. Part B: Coat. Trans. 86 2003 43
22. A.F. Thünemann, and K.H. Lochhaas Langmuir 14 1998 4898
23. I.J. Park, S.B. Lee, and C.K. Choi Polymer 38 1997 2523
24. T. Imae, H. Tabuchi, K. Funayama, A. Sato, T. Nakamura, and N. Amaya Colloid Surface A: Physicochem. Eng. Aspects 167 2000 73
25. M.J. Krupers, S.S. Sheiko, and M. Möller Polym. Bull. 40 1998 211
26. J.-F. Berret, D. Calvet, A. Collet, and M. Viguier Curr. Opin. Colloid Interface Sci. 8 2003 296
27. H. Ito, T. Imae, T. Nakamura, M. Sugiura, and Y. Oshibe J. Colloid Interface Sci. 276 2004 290
28. K. Li, P. Wu, and Z. Han Polymer 43 2002 4079
29. P. Gopalan, L. Andruzzi, X. Li, and C.K. Ober Macromol. Chem. Phys. 203 2002 1573
30. J. Tsibouklis, and T.G. Nevell Adv. Mater. 15 2003 647
31. T. Nishino, Y. Urushihara, M. Meguro, K. Nakamae, J. Colloid Interface Sci., in press
32. D.K. Owens, and R.C. Wendt J. Appl. Polym. Sci. 13 1969 1741
33. S.M. Fowkes J. Phys. Chem. 67 1963 2538
34. L.E. Alexander X-ray Diffraction Methods in Polymer Science 1969 Wiley New York