Process extensions in optical lithography enabling 45-nm technologies

IEEE Transactions on Semiconductor Manufacturing

Volumn 18, Issue 1, 2005, Pages 37-40

  Zandbergen, Peter ^a   Van Steenwinckel, David ^a   Lammers, Jeroen H ^a   Kwinten, Hans ^a   Juffermans, Casper ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Acid diffusion; Optical lithography; Overbake; Postexposure bake; Process extensions

Indexed keywords

CMOS INTEGRATED CIRCUITS; DATA ACQUISITION; MATHEMATICAL MODELS; PHASE SHIFT; PHOTORESISTS; PROCESS ENGINEERING;

ACID DIFFUSION; OVERBAKE; POSTEXPOSURE BAKE; PROCESS EXTENSIONS;

PHOTOLITHOGRAPHY;

EID: 13844253920     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.841755     Document Type: Article

References (11)

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