Reaction of hydrogen-desorbed Si(100) surfaces with water during heating and cooling

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 12, 2004, Pages 8242-8247

  Urabe, Shinichi ^a   Nishimura, Kazuo ^a   Morita, Satoru ^a   Morita, Mizuho ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Hydrogen; Reaction; Silicon; Surface; Temperature programmed desorption; Thermal desorption spectroscopy; Water

Indexed keywords

COOLING; HEAT TREATMENT; HYDROGEN; SILICA; SPECTROSCOPIC ANALYSIS; SURFACE PROPERTIES; TEMPERATURE PROGRAMMED DESORPTION; WATER;

HYDROGEN DESORPTION; REACTION; SURFACE; THERMAL DESORPTION SPECTROSCOPY;

SILICON;

EID: 13644283468     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.8242     Document Type: Article

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