Super linear position sensitive detectors using MIS structures

Optical Materials

Volumn 27, Issue 5, 2005, Pages 1088-1092

  Aguas H ^a   Pereira, L ^a   Costa, D ^a   Fortunato, E ^a   Martins, R ^a  

^a Center of Excellence in Microelectronics Optoelectronics and Processes   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DETECTORS; ELECTRIC POTENTIAL; ELECTRONIC VOLTMETERS; ELLIPSOMETRY; GOLD; MULTILAYERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SENSITIVITY ANALYSIS; SILICON;

ELECTRON GUN SYSTEM; METAL INSULATOR SEMICONDUCTORS (MIS); MULTILAYER SYSTEM (MLS); POSITION SENSITIVE DETECTORS (PSD);

METAL INSULATOR BOUNDARIES;

EID: 13544275669     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2004.08.067     Document Type: Conference Paper

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