AlN thin films prepared by the electron shower method

Hyomen Gijutsu/Journal of the Surface Finishing Society of Japan

Volumn 47, Issue 2, 1996, Pages 152-156

  Ishihara, M ^a   Yumoto, H ^a   Tsuchiya, T ^a   Akashi, K ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CRYSTAL ORIENTATION; ELECTRON BEAMS; THIN FILMS;

ALUMINIUM NITRIDES; BINARY COMPOUNDS; CRYSTAL GROWTH FROM VAPORS; EXPERIMENTAL STUDY; OPERATING MODE; PHYSICAL VAPOR DEPOSITION; PREFERRED ORIENTATION;

CRYSTAL GROWTH;

EID: 0030372820     PISSN: 09151869     EISSN: None     Source Type: Journal    
DOI: 10.4139/sfj.47.152     Document Type: Article

References (14)