Design and fabrication of diffractive optical elements by use of gray-scale photolithography

Applied Optics

Volumn 44, Issue 4, 2005, Pages 506-511

  Sohn, Jin Seung ^a   Lee, Myung Bok ^b   Kim, Wan Chin ^a   Cho, Eun Hyung ^b   Kim, Tae Wan ^c   Yoon, Chan Young ^a   Park, No Cheol ^a   Park, Young Pil ^a  

^a Yonsei University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^c Minuta Tech   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; LASER BEAM EFFECTS; MASKS; OPTICAL DESIGN; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

DIFFRACTIVE OPTICAL ELEMENTS (DOE); GRAY-SCALE PHOTOLITHOGRAPHY; MASK CODING; OPTICAL COMPONENTS;

DIFFRACTIVE OPTICS;

EID: 13444301287     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.44.000506     Document Type: Article

References (11)

1. N. F. Borrelli, Microoptics Technology (Marcel Dekker, New York, 1999).
2. Z. Liping, L. Y. Loy, and Z. Yan, "Quasi-continuous mask-coding method for fabricating diffractive optical elements," in Micromachine Technology for Diffractive and Holographic Optics, S. H. Lee and J. Allen Cox, eds., Proc. SPIE 3879, 106-115 (1999).
3. H. P. Herzig, ed., Micro-Optics: Elements, Systems and Applications (Taylor & Francis, London, 1997).
4. C. Wu, "Method of making high energy beam sensitive glasses," U.S. patent 5,078,771 (7 January 1992).
5. W. Däschner, P. Long, P. Stein, C. Wu, and S. H. Lee, "Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass," Appl. Opt. 36, 4675-4680 (1997).
6. S. Sinzinger and J. Jahns, Microoptics (Wiley-VCH, Weinhein, Germany, 1999).
7. M. C. Hutley, "The manufacture of microlenses," in Diffractive Optics: Design, Fabrication, and Applications, postconference ed., Vol. 11 of 1994 OSA Technical Digest Series (Optical Society of America, Washington, D.C., 1994), pp. 316-319.
8. S.-J. Choi, P. J. Yoo, S. J. Baek, T. W. Kim, and H. H. Lee, "An ultraviolet-curable mold for sub-100-nm lithography," J. Am. Chem. Soc. 126, 7744-7755 (2004).
9. J. F. Isenberg, Advanced Topics in CODE V Training (Optical Technology Education Center, Incheon, Korea, 2003).
10. Y. Oppliger, P. Sixt, J. M. Stauffer, J. M. Mayor, P. Regnault, and G. Voirin, "One-step 3D shaping using a gray-tone mask for optical and microelectronic applications," Microelectron. Eng. 23, 449-454 (1994).
11. V. P. Koronkevich, V. P. Kiryanov, V. P. Korol'kov, G. Poleshchuk, V. A. Cherkashin, and A. A. Kharissov, "Fabrication of diffractive optical elements by laser writing with circular scanning," in Diffractive Optics: Design, Fabrication, and Applications, postconference ed. Vol. 11 of 1994 OSA Technical Digest Series (Optical Society of America, Washington, D.C., 1994), pp. 310-313.