Ge islands and photonic crystals for Si-based photonics

Optical Materials

Volumn 27, Issue 5, 2005, Pages 792-798

  Boucaud, P ^a   Li, X ^a   Kurdi, M El ^a   David, S ^a   Checoury, X ^a   Sauvage, S ^a   Kammerer, C ^a   Cabaret, S ^a   Thanh, V Le ^a   Bouchier, D ^a   Lourtioz, J M ^a   Kermarrec, O ^b   Campidelli, Y ^b   Bensahel, D ^b  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; HYDROGEN; OPTICAL WAVEGUIDES; PERMITTIVITY; PHOTOLUMINESCENCE; QUANTUM EFFICIENCY; SELF ASSEMBLY; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; STIMULATED EMISSION; WAVELENGTH DIVISION MULTIPLEXING;

CUT-OFF FREQUENCIES; FILLING FACTOR; PHOTONIC CRYSTALS; SILICON-BASED PHOTONICS;

CRYSTALLOGRAPHY;

EID: 13444291527     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2004.08.001     Document Type: Conference Paper

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