Effect of the pump intensity on the efficiency of a KrF excimer electric-discharge laser on a He - Kr - F2 mixture

Quantum Electronics

Volumn 34, Issue 10, 2004, Pages 901-906

  Razhev, A M ^a   Shchedrin, A I ^b   Kalyuzhnaya, A G ^b   Ryabtsev, A V ^b   Zhupikov, A A ^a  

^a INSTITUTE OF LASER PHYSICS   (Russian Federation)

^b INSTITUTE OF PHYSICS   (Ukraine)

Author keywords

Buffer gas; KrF excimer laser; Output energy; Pump intensity

Indexed keywords

CAPACITORS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; HELIUM; INDUCTANCE; INTEGRATED CIRCUITS; KRYPTON; MICROELECTRONICS; PHOTOLITHOGRAPHY;

BUFFER GAS; KRF EXCIMER LASERS; OUTPUT ENERGY; PUMP INTENSITY;

EXCIMER LASERS;

EID: 13444270419     PISSN: 10637818     EISSN: None     Source Type: Journal    
DOI: 10.1070/QE2004v034n10ABEH002656     Document Type: Article

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