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Volumn 23, Issue 9, 2002, Pages 1351-1354

Application of an anthracene containing polymer to a negative type photoresist

Author keywords

Anthracene polymer; Photo crosslinking; Photoresist

Indexed keywords

ANTHRACENE DERIVATIVE; POLYMER;

EID: 0037145138     PISSN: 02532964     EISSN: None     Source Type: Journal    
DOI: 10.5012/bkcs.2002.23.9.1351     Document Type: Article
Times cited : (13)

References (14)
  • 12
    • 0011751090 scopus 로고    scopus 로고
    • 38th Macromolecular IUPAC Symposium; Polish Chemical Society: Warsaw, Poland
    • Kim, Y. W.; Chae, K. H. IUPAC Macro 2000 Meeting Abstracts, vol. 2: 38th Macromolecular IUPAC Symposium; Polish Chemical Society: Warsaw, Poland, 2000; p 839.
    • (2000) IUPAC Macro 2000 Meeting Abstracts , vol.2 , pp. 839
    • Kim, Y.W.1    Chae, K.H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.