Effect of work hardening on the critical indentation limit in spherical nano-indentation of thin film/substrate systems

Surface and Coatings Technology

Volumn 179, Issue 2-3, 2004, Pages 324-332

  Yoo, Yo Han ^a   Lee, Woong ^b   Shin, Hyunho ^a  

^a Agency for Defence Development   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

Critical indentation limit; Numerical analysis; Spherical indentation; Work hardening

Indexed keywords

FINITE ELEMENT METHOD; INDENTATION; STRAIN HARDENING; YIELD STRESS;

HARDENING EFFECTS; INDENTATION DEPTHS;

THIN FILMS;

FILM THICKNESS; HARDENING;

EID: 1342289015     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00814-4     Document Type: Article

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