Influence of the film structure on the properties of electrochromic CeO2 thin films deposited by e-beam PVD

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 119-124

  Porqueras, I ^a   Person, C ^a   Bertran, E ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Cerium oxide; Electrochromic materials; Ion bombarded films

Indexed keywords

ABSORPTION; CERIUM COMPOUNDS; DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; ELECTRIC IMPEDANCE MEASUREMENT; ELECTROCHROMIC DEVICES; ELECTROCHROMISM; ELECTRON BEAMS; GLASS; ION BOMBARDMENT; OXYGEN; PHYSICAL VAPOR DEPOSITION;

ELECTRICAL SIGNALS; ION BOMBARDED FILMS;

THIN FILMS;

EID: 1342281317     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.09.034     Document Type: Conference Paper

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