Low temperature silicon dioxide film deposition by remote plasma enhanced chemical vapor deposition: Growth mechanism

Surface and Coatings Technology

Volumn 179, Issue 2-3, 2004, Pages 229-236

  Park, Young Bae ^a   Rhee, Shi Woo ^b  

^a HARVARD UNIVERSITY   (United States)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Deposition; PECVD; Precursor; SiO2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HYDROGEN BONDS; OXIDATION; SURFACE ROUGHNESS; THERMAL EFFECTS; THIN FILMS;

CHARGED ION BOMBARDMENT; SURFACE OXIDATION REACTION;

SILICA;

CHEMICAL VAPOR DEPOSITION; COATING;

EID: 1342265679     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00852-1     Document Type: Article

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